Yamato PR Series Plasma Reactors (Precision Ashing & Descumming)

Eliminate organic residues and photoresists with atomic precision. The Yamato PR series provides high-power plasma ashing for advanced semiconductor workflows. Contact Renetech!

The Product Description

Aggressive, Chemical-Free Organic Removal When your semiconductor facility or failure analysis laboratory needs to strip photoresists from wafers, clean MEMS devices, or remove heavy organic residues, traditional wet-chemical baths are hazardous, wasteful, and often leave behind trace contaminants. You need a method that literally vaporizes organics at the atomic level without damaging the underlying substrate.

The Yamato PR Series is the ultimate solution. Engineered as a dedicated Plasma Reactor, this system excels at Plasma Ashing. By introducing oxygen or specialized gas mixtures under a strict vacuum and hitting them with high-frequency RF power, the PR series generates a highly reactive plasma cloud. This plasma chemically reacts with organic films, turning them into volatile gases that are instantly pumped away, leaving your wafers and substrates flawlessly clean.

Three Powerful Reactors for Your Ashing Workloads Manufactured to elite Japanese standards, the PR series features highly durable reactor chambers designed to withstand continuous RF plasma generation. We supply three distinct models to match your facility's daily throughput and wafer sizes:

• PR200 (The Compact Ashing Reactor): The ideal system for R&D laboratories, university cleanrooms, and failure analysis workstations. It provides highly focused RF power for individual wafer descumming and precision organic removal without dominating your bench space.

• PR500 & PR510 (The High-Capacity Workhorses): The heavy-hitters of the lineup. These models feature significantly upgraded RF power and expanded reactor chambers. They are engineered specifically for commercial-scale pilot plants, high-throughput semiconductor processing, and treating larger substrates where extreme plasma uniformity and aggressive ashing speeds are required.

Precision Gas Flow & Uncompromising Safety Successful plasma ashing requires absolute control over your process gases. The Yamato PR series features highly accurate digital controllers and mass flow control capabilities, allowing your technicians to dial in the perfect gas mixture and vacuum pressure for the specific photoresist they are stripping. Furthermore, to protect your expensive wafers, the system is equipped with an elite safety suite, including RF overload protection, vacuum interlocks, and automated purge cycles to ensure hazardous gases are safely evacuated before the chamber is opened.

Your Authorized Malaysian Scientific Equipment Distributor Attention Semiconductor Plant Managers and Failure Analysis Directors: Renetech is your authorized supplier for essential B2B laboratory equipment Malaysia. We specialize in outfitting advanced cleanrooms with the exact Japanese plasma engineering required to keep your wafers perfectly descummed, heavily ashed, and free of all organic residues.

Request a Plasma Reactor Quote Today! Click the button below to message the Renetech sales team on WhatsApp. Let us provide a highly competitive quote on the Yamato PR200, PR500, or PR510 to instantly upgrade your laboratory's plasma ashing capabilities today!

Plasma Reactor (Barrel Chamber) (PR510)

Plasma Reactor (Barrel Chamber) (PR500)

Plasma Reactor (Barrel Chamber) (PR301)

Plasma Reactor (Barrel Chamber) (PR300)

Plasma Reactor (Barrel Chamber) (PR200)